Priority Deadline January 14, 2012
International Limited-Residency MFA in Photography
Summer Residency: Hartford, CT
Fall Residencies: NYC & San Francisco
Spring Residency: Berlin
For more information: www.hartfordphotomfa.org
About
The international limited-residency MFA in Photography at the Hartford Art School is an innovative program designed for both mature individuals with established experience in the field as well as recent graduates who wish to further their own practice and acquire an MFA degree in order to facilitate their professional credentials as artists and educators.
Q? How does this limited-residency model work?
A: Our approach offers a “blended learning model”—research, independent study, and online critiques—with on-site classroom learning. The program couples intensive on-campus sessions during the summer with travel components in the spring and fall. The summer sessions meet at the University of Hartford for two-weeks, during which time students and faculty interact inside and outside the classroom. The fall and spring sessions meet at off-site locations such as NYC, San Francisco and Berlin for 7–10 days. In the time between classroom sessions students complete course assignments and maintain regular contact with their Thesis Advisor. The total time to the MFA is twenty-five months, of which only ten to twelve weeks are spent away from your studio.
Q? Who are the faculty?
A: The faculty is gathered from the United States and International locations and is augmented by visiting artists, curators, writers and other leading professionals in the field.
Faculty
ALEC SOTH (USA)
DOUG DUBOIS (USA)
MICHAEL SCHÄFER (GERMANY)
ROBERT LYONS (USA)
MARY FREY (USA)
DR. JÖRG M COLBERG (USA)
Visiting Artists and Guests
Adam Bartos, Roe Etheridge, Larry Fink, Justine Kurland, Thomas Weski, Ute Mahler, Werner Mahler, Wiebke Loeper, Joachim Brohm, Markus Schaden, Michael Schmidt, Mark Tomlinson – master book binder.
Q? Why a limited-residency model?
A: This new model enhances a student’s ability to pursue a higher education degree while allowing the student to continue to participate in their own community. Students can engage in projects that are not site specific or nearby the University throughout the program, as well as continue in their professional responsibilities as educators or committed professionals in the field.
Admission
The international limited-residency MFA in Photography at the Hartford Art School is designed to attract mature practitioners in the field from all over the globe. A check off list of what you need to apply for admission can be found in the downloadable version of the application. The application can also be completed and filed electronically.
Of special note: all applicants must already have a recognized baccalaureate degree from an accredited institution. Students who earned their degree outside of the USA, will use the World Education Services (WES) to validate their transcripts. In addition international students are required to have completed the TOEFL unless waived by the director of the program.
The priority deadline for application is January 14, 2012. Applications will be considered until the class is full.
